JPH0210361B2 - - Google Patents
Info
- Publication number
- JPH0210361B2 JPH0210361B2 JP63146013A JP14601388A JPH0210361B2 JP H0210361 B2 JPH0210361 B2 JP H0210361B2 JP 63146013 A JP63146013 A JP 63146013A JP 14601388 A JP14601388 A JP 14601388A JP H0210361 B2 JPH0210361 B2 JP H0210361B2
- Authority
- JP
- Japan
- Prior art keywords
- objective lens
- irradiation
- onto
- optical system
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 claims description 67
- 238000001514 detection method Methods 0.000 claims description 28
- 230000004907 flux Effects 0.000 claims description 3
- 238000010586 diagram Methods 0.000 description 4
- 238000005286 illumination Methods 0.000 description 3
- 230000007246 mechanism Effects 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910052785 arsenic Inorganic materials 0.000 description 1
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000007723 transport mechanism Effects 0.000 description 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63146013A JPS6446606A (en) | 1988-06-14 | 1988-06-14 | Horizontal position detecting device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63146013A JPS6446606A (en) | 1988-06-14 | 1988-06-14 | Horizontal position detecting device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6446606A JPS6446606A (en) | 1989-02-21 |
JPH0210361B2 true JPH0210361B2 (en]) | 1990-03-07 |
Family
ID=15398121
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63146013A Granted JPS6446606A (en) | 1988-06-14 | 1988-06-14 | Horizontal position detecting device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6446606A (en]) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5184926A (en) * | 1990-11-05 | 1993-02-09 | Megatool, Inc. | Root-strength drill bit and method of making |
-
1988
- 1988-06-14 JP JP63146013A patent/JPS6446606A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6446606A (en) | 1989-02-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JPH0442601B2 (en]) | ||
JPH0545889A (ja) | 投影露光装置 | |
JPS6355002B2 (en]) | ||
JPH1022213A (ja) | 位置検出装置及びそれを用いたデバイスの製造方法 | |
US5717492A (en) | Position detecting apparatus and a method for manufacturing semiconductor devices using the apparatus | |
US5726757A (en) | Alignment method | |
JP2000299276A (ja) | 露光装置 | |
JPH05226217A (ja) | 投影型露光装置 | |
JPH0210361B2 (en]) | ||
JP3143514B2 (ja) | 面位置検出装置及びこれを有する露光装置 | |
JPH0744138B2 (ja) | 位置合わせ装置 | |
JP2556074B2 (ja) | 投影露光装置、投影露光方法及び水平位置検出装置 | |
JPH10172900A (ja) | 露光装置 | |
JP3381740B2 (ja) | 露光方法及び投影露光装置 | |
JP3448663B2 (ja) | 投影露光装置 | |
JPH07142346A (ja) | 投影露光装置 | |
JPH0739955B2 (ja) | 表面変位検出装置 | |
JPH11304422A (ja) | 位置検出装置及び位置検出方法並びに露光装置 | |
JP2569713B2 (ja) | 投影露光装置 | |
JP2897085B2 (ja) | 水平位置検出装置及びそれを備えた露光装置 | |
JPS61230114A (ja) | アライメント光学装置 | |
JPH10261576A (ja) | 投影露光装置 | |
JP3158538B2 (ja) | 基板表面の光学的検査装置及び方法 | |
JP2000182929A (ja) | 面位置検出装置 | |
JPH0653119A (ja) | 投影型露光装置 |